Atomic Layer Deposition of Tin Monosulfide Using Vapor from Liquid Bis(N,N′-diisopropylformamidinato)tin(II) and H2S

نویسندگان
چکیده

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Atomic Layer Deposition of Tin Monosulfide Thin Films

Thin film solar cells made from earth-abundant, non-toxic materials are needed to replace the current technology that uses Cu(In,Ga)(S,Se)2 and CdTe, which contain scarce and toxic elements. One promising candidate absorber material is tin monosulfide (SnS). In this report, pure, stoichiometric, single-phase SnS films were obtained by atomic layer deposition (ALD) using the reaction of bis(N,N’...

متن کامل

Atomic layer deposition of tin oxide films using tetrakis„dimethylamino... tin

The authors present a new method for preparing thin films of SnO2 by atomic layer deposition ALD using alternating exposures to tetrakis dimethylamino tin and hydrogen peroxide. This method avoids problems of corrosion and agglomeration associated with the halogenated compound, SnCl4. Tin oxide films were successfully deposited on a variety of substrates using deposition temperatures of 50–300 ...

متن کامل

Low Temperature Atomic Layer Deposition of Tin Oxide

Atomic layer deposition (ALD) of tin oxide (SnOx) films was achieved using a newly synthesized tin precursor and hydrogen peroxide. We obtained highly pure, conductive SnOx films at temperatures as low as 50 C, which was possible because of high chemical reactivity between the new Sn precursor and hydrogen peroxide. The growth per cycle is around 0.18 nm/cycle in the ALDwindow up to 150 C, and ...

متن کامل

Surface chemistry and film growth during TiN atomic layer deposition 4 using TDMAT and NH 3

22 Abstract 23 24 Surface chemistry and film growth were examined during titanium nitride (TiN) atomic layer deposition (ALD) using sequential 25 exposures of tetrakis-dimethylamino titanium (TDMAT) and NH . This ALD system is shown to be far from ideal and illustrates 3 26 many potential problems that may affect ALD processing. These studies were performed using in situ Fourier transform infra...

متن کامل

Design and implementation of a novel portable atomic layer deposition/chemical vapor deposition hybrid reactor.

We report the development of a novel portable atomic layer deposition chemical vapor deposition (ALD/CVD) hybrid reactor setup. Unique feature of this reactor is the use of ALD/CVD mode in a single portable deposition system to fabricate multi-layer thin films over a broad range from "bulk-like" multi-micrometer to nanometer atomic dimensions. The precursor delivery system and control-architect...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: ACS Applied Materials & Interfaces

سال: 2019

ISSN: 1944-8244,1944-8252

DOI: 10.1021/acsami.9b16933